Monitoring resistance of a thin-film coating in real time

Authors: Fedyunin A.P.
Published in issue: #11(16)/2017
DOI: 10.18698/2541-8009-2017-11-203
Category: Instrument Engineering, Metrology, Information-Measuring Instruments and Systems | Chapter: Solid-state electronics, radioelectronic components, micro - and nanoelectronics
Keywords: resistance monitoring, electron and ion beam technologies, magnetron sputter deposition, evaporation, thin films, processing station, analog-to-digital convertor, nanoscale island structures
Published: 30.10.2017

One of the priority problems in controlling manufacturing processes of forming thin-film coatings is stopping the process when the electrical resistance of the film reaches a preset value. The study deals with controlling the thickness of a conductive coating by means of its electrical resistance. We suggest an electric measuring system for implementing this control technique, which is aimed at obtaining nanoscale island structures and may be built into the substrate holder of the chamber hardware. We conducted experiments in measuring actual resistance of a thin film during the process of magnetron sputter deposition.

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