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Features of photolitography in a deep uv
| Authors: Baklykov D.A., Gromov M.I., Tashev R.A. | Published: 08.10.2019 |
| Published in issue: #10(39)/2019 | |
| DOI: DOI: 10.18698/2541-8009-2019-10-535 | |
| Category: Mechanical Engineering and Machine Science | Chapter: Technology and Equipment of Mechanical and Physical Processing | |
| Keywords: deep ultraviolet photolithography, numerical aperture, Rayleigh criterion, drop plasma source, high-temperature plasma, multilayer optical system, photomask, photoresist | |